Gigaphoton Inc., a major lithography light source manufacturer,
announced today that it has successfully achieved 92 W EUV light source
output at 4.2 percent conversion efficiency (CE) on its prototype
laser-produced plasma (LPP) light sources for EUV lithography scanners.
The 92 W output was achieved by irradiating an Sn target (tin droplet)
with a solid-state pre-pulse laser and a CO2 laser after
combining and optimizing these lasers. Gigaphoton remains committed to
continuing its R&D efforts, targeting 150 W output by the end of 2014
and ultimately up to 250 W output for high-volume manufacturing.
The prototype LPP light source that has achieved 92 W output with
Gigaphoton's unique technologies allows emission of EUV by radiating
ultra-small tin (Sn) droplets of less than 20 µm in diameter with the
solid-state pre-pulse laser and main pulse CO2 laser. In
addition, a combination of a high-output superconducting magnet and Sn
etching allows supprssion of Sn debris caused by radiation. To maximize
the life of the collector mirror, a high-output superconducting magnet
generates a powerful magnetic field to guide unwanted debris caused by
thermal expansion of the tin droplets towards the tin catcher.
"The achievement of 92 W output with our EUV light source is a fruit of
the steady-yet-unique R&D efforts that we have made to achieve
development of higher output, stable, and lower CoO LPP light sources,"
said Hitoshi Tomaru, President and CEO of Gigaphoton, "I believe that
Gigaphoton's expertise and efforts to develop the LPP light source that
accelerates development of EUV scanners for HVM will further encourage
the industry to introduce EUV scanners as the next-generation
* This utilizes the achievement of a program subsidized by NEDO(New
Energy and Industrial Technology Development Organization)
Since it was founded in 2000, Gigaphoton has developed and delivered
user-friendly, high-performance DUV laser light sources used by major
semiconductor manufacturers in the Pan-Asian, US and European regions.
Gigaphoton's patented, innovative LPP EUV technology solutions lead the
way to cost-effective, highly productive lithography light sources for
high-volume production. With a global business outlook, Gigaphoton
strives to be the world's number-one lithography light source provider,
focusing on end-user needs in every phase of its business, from research
and development to manufacturing to best-in-class reliability and
world-class customer support. Visit http://www.gigaphoton.com.
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