Vistec Electron Beam GmbH, a leading supplier of electron-beam
lithography systems, announced that Fraunhofer ENAS in Chemnitz has
purchased a Variable Shaped Beam system Vistec SB254. The Fraunhofer
Institute for Electronic Nano Systems ENAS, a leading research center
within Germany's Fraunhofer-Gesellschaft, will utilize the new
electron-beam lithography system for their micro and nano technologies
in a wide range of applications.
The Fraunhofer ENAS owns an excellent technological know-how in the
field of smart systems integration, micro and nano systems and micro and
nano electronics. The core competencies comprise design, development,
test and evaluation of reliability of components and systems,
interconnect technologies as well as system integration. "The new
electron-beam lithography system was chosen due to its operational
flexibility and capacity to handle a large variety of different
materials, high performance accuracy combined with a top level of
automation. These features are essential to fulfill the requirements of
our customers and partners in research and industry.", states Professor
Dr. Thomas Gessner, Director of Fraunhofer ENAS.
The Fraunhofer ENAS purchase decision has been based on the result of an
European tendering procedure including an intensive evaluation.
The Vistec SB254 is a high performance, cost-effective and universal
electron-beam lithography system, enabling the usage for both direct
write and mask making for a large variety of applications in industry
and applied research.
The system is capable of handling and exposing transparent and
non-transparent materials which are widely used in semiconductor and
optical applications. Equipped with 50 kV Variable Shaped Beam electron
optics, an address grid of 1 nm and an exposure platform with stage
travel range of 210 mm x 210 mm this system enables lithography below
20nm on various substrates from pieces up to 200 mm wafers and 7 inch
As an optional feature, Cell Projection is also available. A Graphical
User Interface (GUI) and fully automated cassette-to-cassette substrate
handling, including substrate pre-alignment, allow the effective usage
in an environment with consistently changing requirements. Furthermore
the system features the data preparation software package ePLACE
(provided by EQUIcon Software GmbH).
"We are very pleased, that Fraunhofer ENAS placed the order with Vistec.
The installation of the new Vistec SB254 constitutes a new level of
collaboration which started more than 20 years ago." comments Wolfgang
Dorl, General Manager of Vistec Electron Beam.
The product and service portfolio of the Fraunhofer Institute for
Electronic Nano Systems ENAS covers high-precision sensors for
industrial applications, sensor and actuator systems with control units
and evaluation electronics, printed functionalities like antennas and
batteries as well as material and reliability research for
microelectronics and micro system technology. The development, the
design and the test of MEMS/NEMS, methods and technologies for their
encapsulation and integration with electronics as well as micro and nano
electronics and 3D integration are especially in the focus of the work.
Application areas are semiconductor industry, medical engineering,
mechanical engineering, automotive industry, logistics as well as
Vistec Electron Beam
Vistec Electron Beam GmbH provides leading technology solutions for
advanced electron-beam lithography. Based on the Variable Shaped Beam
(VSB) principle, the electron-beam lithography systems are mainly
utilized for semiconductor applications and advanced research such as
silicon direct write, compound semiconductor, mask making, integrated
optics and several new emerging markets.
The company is located in Jena, Germany. In addition to its production
facility in Germany, Vistec Electron Beam maintains service and support
centers in Europe and Taiwan.
Product information: http://www.vistec-semi.com/products-applications/products/vistec-sb254/
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