TMCNet:  ASM America Assigned Patent

[February 04, 2013]

ASM America Assigned Patent

(Targeted News Service Via Acquire Media NewsEdge) By Targeted News Service ALEXANDRIA, Va., Feb. 4 -- ASM America, Phoenix, has been assigned a patent (8,360,001) developed by Michael A. Todd, Phoenix, and Mark Hawkins, Gilbert, Ariz., for a "process for deposition of semiconductor films." The abstract of the patent published by the U.S. Patent and Trademark Office states: "Chemical vapor deposition processes utilize chemical precursors that allow for the deposition of thin films to be conducted at or near the mass transport limited regime. The processes have high deposition rates yet produce more uniform films, both compositionally and in thickness, than films prepared using conventional chemical precursors. In preferred embodiments, a higher order silane is employed to deposit thin films containing silicon that are useful in the semiconductor industry in various applications such as transistor gate electrodes." The patent application was filed on July 16, 2009 (12/504,269.). The full-text of the patent can be found at Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=83,60,001.PN.&OS=PN/83,60,001&RS=PN/83,60,001 Written by Amal Ahmed; edited by Jaya Anand.

AM0204JA0204-837794 (c) 2013 Targeted News Service

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